Title :
A CMOS-Compatible, Low-Loss, and Low-Crosstalk Silicon Waveguide Crossing
Author :
Yi Zhang ; Shuyu Yang ; Lim, Andy Eu-Jin ; Guo-Qiang Lo ; Galland, Christophe ; Baehr-Jones, Tom ; Hochberg, Michael
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Delaware, Newark, DE, USA
Abstract :
We demonstrated a waveguide crossing for submicron silicon waveguides with average insertion loss of 0.18±0.03 dB and crosstalk of -41±2 dB, uniform across an 8-inch wafer. The device was fabricated in a CMOS-compatible process using 248 nm lithography, with only one patterning step.
Keywords :
CMOS integrated circuits; elemental semiconductors; integrated optics; integrated optoelectronics; lithography; optical crosstalk; optical fabrication; optical losses; optical waveguides; silicon; CMOS-compatible silicon waveguide crossing; Si; crosstalk; device fabrication; insertion loss; lithography; low-crosstalk silicon waveguide crossing; low-loss silicon waveguide crossing; patterning; size 8 inch; wavelength 248 nm; CMOS integrated circuits; Couplers; Gratings; Insertion loss; Optical waveguides; Photonics; Silicon; Silicon on insulator technology; wafer scale integration; waveguide junctions;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2013.2241049
