A CMOS-Compatible, Low-Loss, and Low-Crosstalk Silicon Waveguide Crossing

Author

Yi Zhang ; Shuyu Yang ; Lim, Andy Eu-Jin ; Guo-Qiang Lo ; Galland, Christophe ; Baehr-Jones, Tom ; Hochberg, Michael

Author_Institution

Dept. of Electr. & Comput. Eng., Univ. of Delaware, Newark, DE, USA

Volume

Issue

fYear

2013

fDate

1-Mar-13

Firstpage

422

Lastpage

425

Abstract

We demonstrated a waveguide crossing for submicron silicon waveguides with average insertion loss of 0.18±0.03 dB and crosstalk of -41±2 dB, uniform across an 8-inch wafer. The device was fabricated in a CMOS-compatible process using 248 nm lithography, with only one patterning step.

Keywords

CMOS integrated circuits; elemental semiconductors; integrated optics; integrated optoelectronics; lithography; optical crosstalk; optical fabrication; optical losses; optical waveguides; silicon; CMOS-compatible silicon waveguide crossing; Si; crosstalk; device fabrication; insertion loss; lithography; low-crosstalk silicon waveguide crossing; low-loss silicon waveguide crossing; patterning; size 8 inch; wavelength 248 nm; CMOS integrated circuits; Couplers; Gratings; Insertion loss; Optical waveguides; Photonics; Silicon; Silicon on insulator technology; wafer scale integration; waveguide junctions;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2013.2241049

Filename

6415246

Link To Document

https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=16569