In-situ synchrotron X-ray diffraction measurement of epitaxial FeRh thin films

Author

Jang, Sung-Uk ; Hyun, Seungmin ; Lee, Hwan Soo ; Kwon, Soon-Ju ; Kim, Ji-Hong ; Park, Ki-Hoon ; Lee, Hak-Joo

Author_Institution

Dept. of Mater. Sci. & Eng., Pohang Univ. of Sci. & Technol., Pohang, South Korea

fYear

2010

Firstpage

742

Lastpage

743

Abstract

The magnetic properties and structure of FeRh thin film epitaxially grown onto MgO(001) substrate were studied by MPMS(Magnetic Properties Measure System) and in-situ temperature synchrotron XRD(X-ray Diffraction). The transition temperature of FeRh thin films was around 380 K. Both M-T curve and d-spacing changes correspond to each other very closely. Abrupt changes in the lattice constants can be observed from the in-situ analysis. Also, there is the likelihood of existence of a new phase.

Keywords

X-ray diffraction; epitaxial growth; ferromagnetic-antiferromagnetic transitions; iron alloys; lattice constants; magnetic transition temperature; metallic epitaxial layers; rhodium alloys; FeRh; MgO(001) substrate; antiferromagnetic-ferromagnetic phase transition; d-spacing; epitaxial growth; epitaxial thin films; in-situ synchrotron X-ray diffraction measurement; lattice constants; magnetic properties measure system; transition temperature; Heating; Lattices; Magnetic films; Magnetic properties; Materials science and technology; Substrates; Synchrotrons; Temperature; Transistors; X-ray diffraction;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanoelectronics Conference (INEC), 2010 3rd International

Conference_Location

Hong Kong

Print_ISBN

978-1-4244-3543-2

Electronic_ISBN

978-1-4244-3544-9

Type

conf

DOI

10.1109/INEC.2010.5424542

Filename

5424542