• DocumentCode
    1657354
  • Title

    Fixed Beam Moving Stage electron beam lithography of waveguide coupling device structures

  • Author

    Sanabia, Jason E. ; Burcham, Kevin E. ; Klingfus, Joseph ; Piaszenski, Guido ; Kahl, Michael ; Jede, Ralf

  • Author_Institution
    Raith USA, Inc., Ronkonkoma, NY, USA
  • fYear
    2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    The Fixed Beam Moving Stage (FBMS) lithography mode is used toward the fabrication of waveguide coupling device structures. Scanning electron microscope metrology is used for the dimensional characterization of the resulting waveguide structures.
  • Keywords
    electron beam lithography; optical fabrication; optical waveguides; scanning electron microscopy; FBMS lithography; dimensional characterization; fixed beam moving stage electron beam lithography; scanning electron microscopy; waveguide coupling device structures; Couplings; Electron beams; Lithography; Optical device fabrication; Optical resonators; Optical waveguides; Performance evaluation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2012 Conference on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4673-1839-6
  • Type

    conf

  • Filename
    6325802
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1657354