Title :
Highly sensitive Si nanowire-based gas sensors for detection of a nerve agent
Author :
Kim, Yeonju ; Lee, Jun Min ; Lee, Seung Hyun ; Lee, Wooyoung
Author_Institution :
Dept. of Mater. Sci. & Eng., Yonsei Univ., Seoul, South Korea
Abstract :
We report the electrical detection of nerve agent gas using p-type Si-nanowire-based sensors. A combination of electron-beam lithography and a lift-off process was utilized to fabricate individual 50-nm-thick Si nanowire sensors. Using the fabricated Si-nanowire sensors, the detection of DMMP was successfully achieved. Our results suggest that Si-nanowire-based gas sensors can be used to detect dimethylniethylphosphonate (DMMP).
Keywords :
chemical hazards; electron beam lithography; elemental semiconductors; gas sensors; nanofabrication; nanolithography; nanosensors; nanowires; organic compounds; silicon; DMMP detection; Si; chemical warfare agents; dimethylniethylphosphonate detection; electrical detection; electron-beam lithography; highly sensitive p-type silicon nanowire based gas sensor; lift-off process; nerve agent detection; size 50 nm; Gas detectors;
Conference_Titel :
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-3543-2
Electronic_ISBN :
978-1-4244-3544-9
DOI :
10.1109/INEC.2010.5424551
