DocumentCode :
165757
Title :
Gain of 56 in graphene silicon carbide schottky collector phototransistor (GSCBT) for radiation detection
Author :
Brown, G.J. ; Sabih, O.U. ; Shetu, S.S. ; Sudarashan, T.S. ; Chandrashekhar, M.
Author_Institution :
Dept. of Electr. Eng., Univ. of South Carolina, Columbia, SC, USA
fYear :
2014
fDate :
18-21 Aug. 2014
Firstpage :
314
Lastpage :
317
Abstract :
Large low atomic number (Z) windows for novel solid state radiation detection schemes can be conceived by implementation of graphene semi-metal rectifying contacts on SiC epilayers and substrates. The low absorption of Graphene epilayers increases the incident flux/energy to the space charge region increasing detector charge collection. By implementation of a top graphene n-type schottky contact we report bipolar device operation in an epitaxial n-graphene/p-SiC/n-substrate vertical schottky collector bipolar transistor structure. The base current was supplied by e-beam irradiation of 15 keV on the p-SiC base layer. Transistor gains of up to 56 were obtained from the structure. Initial results suggest that gain improvements can be achieved by enhancement of the device interface, increased carrier lifetimes, and shortening the base region width.
Keywords :
Schottky gate field effect transistors; bipolar transistors; epitaxial layers; graphene; phototransistors; radiation detection; semimetallic thin films; silicon compounds; space charge; wide band gap semiconductors; GSCBT; SiC; base region width; bipolar device operation; carrier lifetime; detector charge collection; e-beam irradiation; electron volt energy 15 keV; epitaxial n-graphene/p-SiC/n-substrate; graphene epilayer; graphene n-type Schottky contact; graphene semimetal rectifying contact; graphene silicon carbide Schottky collector phototransistor; incident energy; incident flux; low atomic number window; solid state radiation detection scheme; space charge region; transistor gain; vertical schottky collector bipolar transistor structure; Bipolar transistors; Electrodes; Graphene; Junctions; Silicon carbide; Space charge; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO), 2014 IEEE 14th International Conference on
Conference_Location :
Toronto, ON
Type :
conf
DOI :
10.1109/NANO.2014.6968128
Filename :
6968128
Link To Document :
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