Title :
Single trench SiON waveguide TE-TM mode converter
Author :
Nakayama, K. ; Shoji, Y. ; Mizumoto, T.
Author_Institution :
Tokyo Inst. of Technol., Tokyo, Japan
Abstract :
A TE-TM mode converter fabricated with a single trench SiON waveguide is described. The device has the advantage that only single mask and etching process is needed to fabricate. 80% TE-TM mode conversion is demonstrated.
Keywords :
integrated optics; isolation technology; masks; optical fabrication; optical waveguides; silicon; silicon-on-insulator; Si; TE-TM mode converter; etching; mask process; photonic integrated circuits; single trench waveguide; Etching; Length measurement; Optical device fabrication; Optical waveguides; Periodic structures; Semiconductor waveguides;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2012 Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4673-1839-6
