Title :
Highly conductive aligned carbon film for interconnect application
Author :
Li, Fushan ; Shakerzadeh, Maziar ; Tan, Chongwei ; Yu, Hongyu ; Tay, Bengkang
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
Abstract :
We demonstrate here an amorphous carbon film with a highly conductive transition phase for interconnect application. The uniform orientation of graphite-like sheet provides an effective carriers transport channel, thus significantly improves the conductivity of the amorphous carbon film. The electrical properties of the aligned carbon film are investigated using Kelvin structure. Our results show that the resistivity of aligned carbon film is comparable with that of Cu, and the aligned carbon film holds promise for future interconnect application.
Keywords :
carbon; conducting materials; electrical conductivity; electrical conductivity transitions; thin films; C; Kelvin structure; amorphous carbon film; effective carriers transport channel; electrical conductivity; graphite-like sheet; highly conductive aligned carbon film; highly conductive transition phase; interconnect application; Amorphous materials; Conductive films; Conductivity; Copper; Electric resistance; Electrical resistance measurement; Integrated circuit interconnections; Kelvin; Semiconductor films; Silicon;
Conference_Titel :
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-3543-2
Electronic_ISBN :
978-1-4244-3544-9
DOI :
10.1109/INEC.2010.5424560