Title :
The Effect of Negative Direct Current Bias on the Crystallization of nc-Si:H Films Prepared by Plasma Enhanced Chemical Vapor Deposition
Author :
Slum, J.-H. ; Cho, N.H. ; Lee, E.H.
Author_Institution :
Dept. of Mater. Sci. & Eng., Inha Univ., Inchon
Abstract :
Nanocrystalline Si thin films were prepared by PECVD. The effect of negative DC biases on the formation of Si nanocrystallites in the films and relevant optical features was investigated.
Keywords :
crystallisation; elemental semiconductors; hydrogen; nanostructured materials; nanotechnology; plasma CVD; semiconductor thin films; silicon; PECVD; Si:H; crystallization; nanocrystalline thin films; negative direct current bias effect; plasma enhanced chemical vapor deposition; Chemical vapor deposition; Crystallization; Diffraction; Nanoscale devices; Optical devices; Optical films; Plasma chemistry; Semiconductor films; Semiconductor thin films; Wavelength measurement;
Conference_Titel :
Group IV Photonics, 2007 4th IEEE International Conference on
Conference_Location :
Tokyo
Print_ISBN :
978-1-4244-0934-1
DOI :
10.1109/GROUP4.2007.4347681
