Title :
Optimization considerations for 4 μm SOI-waveguide technology with respect to polarization dependence
Author :
Zimmermann, L. ; Voigt, K. ; Winzer, G. ; Bruns, J. ; Petermann, K.
Author_Institution :
Inst. fur Hochfrequenz-und Halbleiter-Systemtechnologien, Tech. Univ. Berlin, Berlin
Abstract :
The geometry of 4 μm silicon rib waveguides was optimized to reduce sensitivity of modal birefringence to process & substrate nonuniformities. Similar birefringence uniformities have been demonstrated experimentally on BESOI and SmartCut material.
Keywords :
birefringence; light polarisation; optical waveguides; rib waveguides; silicon-on-insulator; BESOI; SOI waveguide; Si; SmartCut material; modal birefringence; optimization; silicon rib waveguides; size 4 mum; Birefringence; Costs; Etching; Geometry; Lithography; Optical fiber polarization; Optical waveguides; Scanning electron microscopy; Silicon on insulator technology; Space technology;
Conference_Titel :
Group IV Photonics, 2007 4th IEEE International Conference on
Conference_Location :
Tokyo
Print_ISBN :
978-1-4244-0934-1
DOI :
10.1109/GROUP4.2007.4347706
