DocumentCode :
1660370
Title :
Deep-UV Lithography Fabrication of Slot Waveguides and Sandwiched Waveguides for Nonlinear Applications
Author :
Jordana, E. ; Fedeli, J.-M. ; Lyan, P. ; Colonna, J.P. ; Gautier, P. ; Daldosso, N. ; Pavesi, L. ; Lebour, Y. ; Pellegrino, P. ; Garrido, B. ; Blasco, J. ; Cuesta-Soto, F. ; Sanchis, P.
Author_Institution :
CEA-Leti, MINATEC, Grenoble
fYear :
2007
Firstpage :
1
Lastpage :
3
Abstract :
Slot and sandwiched waveguides with silicon nanocrystals were fabricated by means of industrial microelectronic tools, including DUV lithography. Low loss of 4 dB/cm will pave the way to compact all-optical NOR logic gates.
Keywords :
elemental semiconductors; micro-optics; nanolithography; nanostructured materials; optical fabrication; optical logic; optical losses; optical waveguides; silicon; ultraviolet lithography; Si; all-optical NOR logic gates; deep-UV lithography; sandwiched waveguides; slot waveguides; Lithography; Nonlinear optical devices; Nonlinear optics; Optical device fabrication; Optical filters; Optical interconnections; Optical refraction; Optical variables control; Optical waveguides; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics, 2007 4th IEEE International Conference on
Conference_Location :
Tokyo
Print_ISBN :
978-1-4244-0934-1
Type :
conf
DOI :
10.1109/GROUP4.2007.4347722
Filename :
4347722
Link To Document :
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