DocumentCode
1661021
Title
Analysis and modeling of nano-crystalline silicon TFTs on flexible substrate with mechanical strain
Author
Lee, M.H. ; Chang, S.T. ; Huang, J.-J. ; Hu, G.-R. ; Huang, Y.-S. ; Lee, C.-C.
Author_Institution
Inst. of Electro-Opt. Sci. & Technol., Nat. Taiwan Normal Univ., Taipei, Taiwan
fYear
2010
Firstpage
654
Lastpage
655
Abstract
The gap state density of nano-crystalline silicon active layer on flexible substrate will be redistributed with mechanical bending. The weak or broken bonds may contribute to the redistribution of trap states. During mechanical strain the deep states are redistributed in a Gaussian distribution, and are dissimilar to ordinary acceptor-like deep states which manifest with exponential distributions. We conclude that the DOS with TCAD modeling under mechanical strain is the fundamental reliability issue for the development of flexible electronics.
Keywords
Gaussian distribution; bending; deep levels; flexible electronics; nanostructured materials; silicon; thin film transistors; Gaussian distribution; Si; TCAD modeling; deep states; flexible electronics; flexible substrate; gap state density; mechanical bending; mechanical strain; nanocrystalline silicon; thin film transistors; trap states edistribution; Amorphous materials; Capacitive sensors; Crystalline materials; Fabrication; Glass; Materials science and technology; Silicon; Solvents; Substrates; Thin film transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location
Hong Kong
Print_ISBN
978-1-4244-3543-2
Electronic_ISBN
978-1-4244-3544-9
Type
conf
DOI
10.1109/INEC.2010.5424674
Filename
5424674
Link To Document