• DocumentCode
    1661021
  • Title

    Analysis and modeling of nano-crystalline silicon TFTs on flexible substrate with mechanical strain

  • Author

    Lee, M.H. ; Chang, S.T. ; Huang, J.-J. ; Hu, G.-R. ; Huang, Y.-S. ; Lee, C.-C.

  • Author_Institution
    Inst. of Electro-Opt. Sci. & Technol., Nat. Taiwan Normal Univ., Taipei, Taiwan
  • fYear
    2010
  • Firstpage
    654
  • Lastpage
    655
  • Abstract
    The gap state density of nano-crystalline silicon active layer on flexible substrate will be redistributed with mechanical bending. The weak or broken bonds may contribute to the redistribution of trap states. During mechanical strain the deep states are redistributed in a Gaussian distribution, and are dissimilar to ordinary acceptor-like deep states which manifest with exponential distributions. We conclude that the DOS with TCAD modeling under mechanical strain is the fundamental reliability issue for the development of flexible electronics.
  • Keywords
    Gaussian distribution; bending; deep levels; flexible electronics; nanostructured materials; silicon; thin film transistors; Gaussian distribution; Si; TCAD modeling; deep states; flexible electronics; flexible substrate; gap state density; mechanical bending; mechanical strain; nanocrystalline silicon; thin film transistors; trap states edistribution; Amorphous materials; Capacitive sensors; Crystalline materials; Fabrication; Glass; Materials science and technology; Silicon; Solvents; Substrates; Thin film transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference (INEC), 2010 3rd International
  • Conference_Location
    Hong Kong
  • Print_ISBN
    978-1-4244-3543-2
  • Electronic_ISBN
    978-1-4244-3544-9
  • Type

    conf

  • DOI
    10.1109/INEC.2010.5424674
  • Filename
    5424674