DocumentCode :
1661200
Title :
Roll to roll fabrication of thin film silicon solar cells on nano-textured substrates.
Author :
Van Aken, B.B. ; Devilee, C. ; Dörenkamper, M. ; Gons, M. ; Heijna, M.C.R. ; Löffler, J. ; Soppe, W.L.
Author_Institution :
ECN Solar Energy, Petten, Netherlands
fYear :
2010
Firstpage :
273
Lastpage :
274
Abstract :
ECN is developing a novel fabrication process for thin film silicon solar cells on steel foil. Key features in this process are: 1) application of an insulating barrier layer which enables monolithic interconnection and texturization of the rear contact with submicron structures for light trapping; 2) Si deposition with remote, linear PECVD; 3) series interconnection by laser scribing and printing after deposition of all layers, which reduces the total number of process steps. The barrier layer is essential for the monolithic series interconnection of cells, but we show that it also enables optimum light trapping in the solar cells. We can fabricate any arbitrary sub-micron surface profile by hot embossing the barrier layer. For deposition of doped and intrinsic silicon layers we use novel remote, linear plasma sources, which are excellently suited for continuous roll-to-roll processing. We have been able to fabricate device-quality amorphous and microcrystalline silicon layers with these sources. The first pin a-Si solar cells have been made on FTO glass, yielding initial efficiencies up to 4.5%. First nip a-Si cells made on steel foil with textured barrier layer yielded efficiencies of about 3.7%.
Keywords :
elemental semiconductors; plasma CVD; semiconductor device manufacture; semiconductor thin films; silicon; solar cells; ECN; FTO glass; Si; Si deposition; amorphous silicon layers; insulating barrier layer; laser scribing; light trapping; linear PECVD; linear plasma sources; microcrystalline silicon layers; monolithic series interconnection; nanotextured substrates; rear contact texturization; roll-to-roll fabrication; thin film silicon solar cells; Embossing; Fabrication; Insulation; Photovoltaic cells; Plasma sources; Printing; Semiconductor thin films; Silicon; Steel; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-3543-2
Electronic_ISBN :
978-1-4244-3544-9
Type :
conf
DOI :
10.1109/INEC.2010.5424681
Filename :
5424681
Link To Document :
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