Drastic reduction of chemical consumption in wet cleaning process for semiconductor manufacturing by using functional water

In cleaning processes of semiconductor manufacturing, a method called `RCA cleaning´ is used for a long time. We suggest `functional water cleaning´ as the first substituted method of RCA cleaning. Functional water for wet cleaning is water that specific gases are dissolved in, mainly hydrogenated water (H2-water) and ozonated water (O3-water). In this paper, we introduce cleaning effect, impact for cost reduction and ESH (Environment, Safety, Health) protection by using functional water.