Title :
Real-time measurement for fast cycle time
Author :
Doering, Robert R.
Author_Institution :
Texas Instrum. Inc., Dallas, TX, USA
Abstract :
Summary form only given. The most challenging overall goal of the Microelectronics Manufacturing Science and Technology (MMST) Program was the demonstration of 3-day cycle time for manufacturing double-level-metal 0.35-μm CMOS circuits. Achievement of this goal was enabled by development of: (1) a 100% single-wafer processing facility and (2) a substantial implementation of real-time process and factory control. In this paper, we focus on the relationship between cycle time and real-time control
Keywords :
CMOS integrated circuits; 0.35 micron; cycle time; double-level-metal CMOS circuits; factory control; microelectronics manufacturing; process control; real-time control; real-time measurement; single-wafer processing; Bibliographies; CMOS technology; Circuits; Instruments; Manufacturing; Observability; Process control; Sensor arrays; Time measurement; Very large scale integration;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop. 1994 IEEE/SEMI
Conference_Location :
Cambridge, MA
Print_ISBN :
0-7803-2053-0
DOI :
10.1109/ASMC.1994.588282
