Title :
Stylus profiler monitors chemical mechanical planarization performance
Author_Institution :
Tencor Instrum., Mountain View, CA, USA
Abstract :
This paper describes the use of stylus-based surface profilers in advanced semiconductor device manufacturing to monitor chemical mechanical planarization (CMP) performance
Keywords :
surface topography measurement; chemical mechanical planarization; semiconductor device manufacturing; stylus; surface profiling; Dielectric materials; Dielectric measurements; Inorganic materials; Optical films; Optical materials; Planarization; Semiconductor device manufacture; Semiconductor films; Silicon; Surface topography;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop. 1994 IEEE/SEMI
Conference_Location :
Cambridge, MA
Print_ISBN :
0-7803-2053-0
DOI :
10.1109/ASMC.1994.588289
