Title : 
Selective-area growth of Ge and Ge/SiGe quantum wells in 3 μm silicon-on-insulator waveguides
         
        
            Author : 
Claussen, Stephanie A. ; Balram, Krishna C. ; Fei, Edward T. ; Kamins, Theodore I. ; Harris, James S. ; Miller, David A B
         
        
            Author_Institution : 
Dept. of Electr. Eng., Stanford Univ., Stanford, CA, USA
         
        
        
        
        
            Abstract : 
We demonstrate a robust process for growing high-quality bulk Ge and Ge/SiGe quantum wells in selected areas of 3 μm thick silicon-on-insulator waveguides, eliminating sidewall growth and hence facilitating low-insertion-loss optical modulators.
         
        
            Keywords : 
Ge-Si alloys; electro-optical modulation; electroabsorption; elemental semiconductors; germanium; optical losses; optical materials; optical waveguides; semiconductor growth; semiconductor quantum wells; silicon-on-insulator; substrates; Ge; Ge-SiGe; Si; low-insertion-loss optical modulators; quantum wells; selective-area growth; silicon-on-insulator waveguides; size 3 mum; substrate preparation process; Epitaxial growth; Fabrication; Modulation; Optical waveguides; Silicon; Silicon germanium; Substrates;
         
        
        
        
            Conference_Titel : 
Lasers and Electro-Optics (CLEO), 2012 Conference on
         
        
            Conference_Location : 
San Jose, CA
         
        
            Print_ISBN : 
978-1-4673-1839-6