• DocumentCode
    1665374
  • Title

    An extreme ultraviolet radiation source based on a gas discharge plasma

  • Author

    Bergmann, K. ; Schriever, G. ; Rosier, O. ; Muller, M. ; Reichartz, D. ; Neff, W. ; Lebert, R.

  • Author_Institution
    Lehrstuhl fur Lasertech., Tech. Hochschule Aachen, Germany
  • Volume
    1
  • fYear
    1999
  • Firstpage
    283
  • Abstract
    An extreme ultraviolet radiation source that emits in the spectral range around 13 nm wavelength or 100 eV photon energy is discussed. The source is based on a small pinch plasma which is generated in a fast discharge of electrically stored energy in the range of 1 Joule. Theoretical considerations are presented which show that this energy is close to the minimal required energy for a dynamic pinch plasma which effectively emits radiation in the spectral range of interest. Here, the constraints given by the gas discharge apparatus have to be taken into account. These constraints refer to, e.g., the length of the plasma column or the achievable compression or number density.
  • Keywords
    discharges (electric); light sources; pinch effect; plasma applications; pulse generators; pulsed power technology; 1 J; 100 EeV; 13 mm; compression; dynamic pinch plasma; electrically stored energy; extreme ultraviolet radiation source; fast discharge; gas discharge apparatus; gas discharge plasma; number density; photon energy; plasma column length; pulsed power; radiation emission; small pinch plasma; Discharges; Electrodes; Fault location; Gas lasers; Lithography; Plasma density; Plasma sources; Plasma temperature; Plasma waves; Ultraviolet sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Pulsed Power Conference, 1999. Digest of Technical Papers. 12th IEEE International
  • Conference_Location
    Monterey, CA, USA
  • Print_ISBN
    0-7803-5498-2
  • Type

    conf

  • DOI
    10.1109/PPC.1999.825466
  • Filename
    825466