Title :
Overview of nanofabrication technologies for field emission devices
Author_Institution :
Rutherford Appleton Lab., Chilton, UK
Abstract :
Fabrication of various field emitter devices (FED) have been possible through recent advances in nanofabrication technologies. The technologies to pattern nanometer scale structures developed by other industries and their applications, was presented in this paper. The great potentials of these nanofabrication technologies should be explored for the benefit of FED development.
Keywords :
field emission; nanopatterning; nanostructured materials; field emission devices; nanofabrication technologies; nanometer scale structures; nanopatterning; overview; Electron optics; Electronics industry; Flat panel displays; Geometry; Integrated circuit technology; Laboratories; Lithography; Nanofabrication; Optical films; Semiconductor device manufacture;
Conference_Titel :
Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
Print_ISBN :
0-7803-8397-4
DOI :
10.1109/IVNC.2005.1619477
