DocumentCode :
1666529
Title :
Chemical gettering at high pressures
Author :
Peters, R.D. ; Hatfield, L.L. ; Kristiansen, M.
Author_Institution :
Dept. of Phys. & Electr. Eng., Texas Tech. Univ., Lubbock, TX, USA
fYear :
1998
Firstpage :
310
Abstract :
Summary form only given. Conventional gettering involves the scavenging of gases in a chamber after the pressure has been first lowered with at least a mechanical pump. Once gettering is complete, as in a vacuum tube; the amount of desorbed gas which would require follow-on pumping is not normally significant. The same is not true for a variety of systems of current interest to the plasma community. The impracticality of connecting an external pump to a fielded system caused us to research the feasibility of gettering at high pressures. It was found that the pressure of carbon dioxide in a closed chamber can be dramatically reduced by letting it react with a mixture of sodium hydroxide and magnesium perchlorate. By distributing the solid reactants throughout a porous substrate to maintain an uncorrupted large surface area, it was found that the chamber pressure in a container of volume 20 filters could be reduced from 1000 mTorr to 100 mTorr a dozen times, with the pumping time in each case being only about two minutes.
Keywords :
chemisorption; getters; high-pressure techniques; pumps; 1000 to 100 mtorr; CO/sub 2/; NaOH-Mg(ClO/sub 4/)/sub 2/; NaOH-Mg(ClO/sub 4/)/sub 2/ mixture; chamber pressure; chemical gettering; desorbed gas; external pump; fielded system; gas scavenging; high pressures; large surface area; mechanical pump; plasma community; porous substrate; pumping time; reactant distribution; solid reactants; Carbon dioxide; Chemicals; Containers; Electron tubes; Gases; Gettering; Joining processes; Magnesium compounds; Plasmas; Solids;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-4792-7
Type :
conf
DOI :
10.1109/PLASMA.1998.677930
Filename :
677930
Link To Document :
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