DocumentCode :
1666567
Title :
Optical reflectometry and ellipsometry measurements of graphene and thin graphitic films on bulk low-index substrates
Author :
Gaskell, Peter E. ; Skulason, Helgi S. ; Szkopek, Thomas
Author_Institution :
Dept. of Electr. & Comput. Eng., McGill Univ., Montreal, QC, Canada
fYear :
2010
Firstpage :
1305
Lastpage :
1306
Abstract :
Optical reflectometry and ellipsometry measurements are taken on graphene layers on a variety of bulk substrates using visible light sources. Using a universal optical conductance model allows accurate determination of layer number. Extension of reflectometry to ellipsometry has the potential to probe anisotropy in optical conductance, and is expected to be useful for graphene sample and device characterization for transparent graphene electrode technology.
Keywords :
ellipsometry; graphene; graphite; insulating thin films; optical conductivity; reflectometry; visible spectra; C; bulk low-index substrates; ellipsometry measurements; graphene; optical reflectometry; thin graphitic films; transparent graphene electrode technology; universal optical conductance model; visible light sources; Ellipsometry; Geometrical optics; Optical films; Optical reflection; Optical refraction; Optical variables control; Reflectometry; Silicon carbide; Stacking; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-3543-2
Electronic_ISBN :
978-1-4244-3544-9
Type :
conf
DOI :
10.1109/INEC.2010.5424884
Filename :
5424884
Link To Document :
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