Optical reflectometry and ellipsometry measurements of graphene and thin graphitic films on bulk low-index substrates

Author

Gaskell, Peter E. ; Skulason, Helgi S. ; Szkopek, Thomas

Author_Institution

Dept. of Electr. & Comput. Eng., McGill Univ., Montreal, QC, Canada

fYear

2010

Firstpage

1305

Lastpage

1306

Abstract

Optical reflectometry and ellipsometry measurements are taken on graphene layers on a variety of bulk substrates using visible light sources. Using a universal optical conductance model allows accurate determination of layer number. Extension of reflectometry to ellipsometry has the potential to probe anisotropy in optical conductance, and is expected to be useful for graphene sample and device characterization for transparent graphene electrode technology.

Keywords

ellipsometry; graphene; graphite; insulating thin films; optical conductivity; reflectometry; visible spectra; C; bulk low-index substrates; ellipsometry measurements; graphene; optical reflectometry; thin graphitic films; transparent graphene electrode technology; universal optical conductance model; visible light sources; Ellipsometry; Geometrical optics; Optical films; Optical reflection; Optical refraction; Optical variables control; Reflectometry; Silicon carbide; Stacking; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanoelectronics Conference (INEC), 2010 3rd International

Conference_Location

Hong Kong

Print_ISBN

978-1-4244-3543-2

Electronic_ISBN

978-1-4244-3544-9

Type

conf

DOI

10.1109/INEC.2010.5424884

Filename

5424884