Sub-wavelength imaging from multilayer superlens

Multilayer superlens has been reported that it had advantages over the original single slab superlens [1]. In this work, single silver layer and Ag-SiO₂ multilayer superlens devices working at wavelength of 365 nm were fabricated using standard photolithography method. Grating object with sub-wavelength resolution could be resolved through both kinds of superlens with working distance up to 128 nm. However, Ag-SiO₂ multilayer superlens shows higher transmittance and image contrasts than the single silver layer one, this result verifies the theoretical results in Ref. [1].