DocumentCode
1667189
Title
Study on the structural and photoluminescence properties of Er-doped ZnO films
Author
Wei, Guoke ; Wang, Jinliang ; Xu, Hengxing ; Tang, Ning ; Fan, Chao
Author_Institution
Dept. of Phys., Beihang Univ., Beijing, China
fYear
2010
Firstpage
1284
Lastpage
1285
Abstract
ZnO films and their Er-doped films oriented in c-axis were prepared on silicon substrate (100) by frequency magnetron sputtering method, and they were taken in heat treatment. Then, the influences on the surface morphologies and crystal structures of the film samples, which were made by the different annealing temperatures and doping concentrations, were analyzed through observing the treatment of SEM and XRD. Their luminescence properties were observed by photoluminescence spectra. The results show that Er-doping enhanced the room temperature UV emission of films. The sample has the strongest luminescence intensity, when the annealing temperature is 800°C and the doping concentration is 2%.
Keywords
II-VI semiconductors; X-ray diffraction; annealing; crystal structure; doping profiles; erbium; photoluminescence; scanning electron microscopy; semiconductor doping; semiconductor thin films; surface morphology; wide band gap semiconductors; zinc compounds; SEM; Si; XRD; ZnO:Er; annealing; crystal structure; doping concentration; films; frequency magnetron sputtering; heat treatment; photoluminescence spectra; room temperature UV emission; surface morphology; temperature 293 K to 298 K; temperature 800 degC; Annealing; Doping; Frequency; Luminescence; Photoluminescence; Semiconductor films; Silicon; Substrates; Temperature; Zinc oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location
Hong Kong
Print_ISBN
978-1-4244-3543-2
Electronic_ISBN
978-1-4244-3544-9
Type
conf
DOI
10.1109/INEC.2010.5424906
Filename
5424906
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