• DocumentCode
    1668500
  • Title

    Field emission enhancement of amorphous carbon nitride films by the addition of argon to the reactive gas of nitrogen

  • Author

    Li, Junjie ; Mimura, Hidenori ; Neo, Yoichiro ; Gu, Changzhi ; Li, Haijun ; Chen, Shuxia

  • Author_Institution
    Res. Inst. of Electron., Shizuoka Univ., Hamamatsu, Japan
  • fYear
    2005
  • Firstpage
    223
  • Lastpage
    224
  • Abstract
    In this paper, the addition of argon to the reactive gas of nitrogen caused the increase of the content and size of sp2-bonded clusters. This caused the domination of the local connectivity and lowered the surface tunnel barrier. Because of this, the field emission of amorphous carbon nitride (a-CNx) films was effectively enhanced.
  • Keywords
    amorphous state; carbon compounds; electron field emission; thin films; CNx; Si; amorphous carbon nanotube films; argon; field emission; nitrogen; reactive gas; sp2-bonded clusters; surface tunnel barrier; Amorphous materials; Argon; Carbon dioxide; Diamond-like carbon; Electron emission; Nitrogen; Optical films; Semiconductor films; Spectroscopy; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
  • Print_ISBN
    0-7803-8397-4
  • Type

    conf

  • DOI
    10.1109/IVNC.2005.1619566
  • Filename
    1619566
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1668500