DocumentCode :
1668542
Title :
Electron emission from planar-type cathodes based on nanocrystalline silicon thin films
Author :
Shimawaki, Hidetaka ; Neo, Yoichiro ; Mimura, Hidenori ; Yokoo, Kuniyoshi
Author_Institution :
Dept. of Syst. & Inf. Eng., Hachinohe Inst. of Technol., Japan
fYear :
2005
Abstract :
Many types of cold cathodes have been studied to realize a high and stable electron emission current. Emission uniformity over a large cathode area and small energy dispersion in emitted electrons are essentially important for a field emission display and high frequency electron beam devices. In addition, a low cost and reliable fabrication of the cathode is also important. We have fabricated nanocrystalline Si planar cathodes by a laser ablation technique and investigated their emission characteristics.
Keywords :
cathodes; electron field emission; elemental semiconductors; laser ablation; nanostructured materials; semiconductor thin films; silicon; Si; electron emission; emitted electrons; energy dispersion; field emission display; laser ablation; nanocrystalline thin films; planar-type cathodes; stable electron emission current; Cathodes; Costs; Electron beams; Electron emission; Flat panel displays; Frequency; Laser ablation; Optical device fabrication; Semiconductor thin films; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
Print_ISBN :
0-7803-8397-4
Type :
conf
DOI :
10.1109/IVNC.2005.1619568
Filename :
1619568
Link To Document :
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