DocumentCode :
1668567
Title :
High aspect ratio Pt field emitters fabricated by electron beam assisted deposition
Author :
Jin, A.Z. ; Wang, Z.L. ; Li, H.J. ; Luo, Q. ; Yang, H.F. ; Cui, Z. ; Gu, C.Z.
Author_Institution :
Beijing Nat. Lab. for Condensed Matter Phys., Chinese Acad. of Sci., Beijing, China
fYear :
2005
Abstract :
In this work, we studied the fabrication of high aspect ratio individual Pt nanopillar as field emitters and measured their field emission properties. Pt nanopillars were fabricated by electron beams (EB) assisted chemical vapor deposition (CVD) method with a dual-beam focused ion beam (FDB) system.
Keywords :
chemical vapour deposition; electron beam deposition; field emitter arrays; focused ion beam technology; nanostructured materials; platinum; Pt; chemical vapor deposition; dual-beam focused ion beam system; electron beam assisted deposition; high aspect ratio field emitters; nanopillar; Anodes; Chemical vapor deposition; Current measurement; Electron beams; Electron emission; Fabrication; Laboratories; Physics; Probes; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
Print_ISBN :
0-7803-8397-4
Type :
conf
DOI :
10.1109/IVNC.2005.1619569
Filename :
1619569
Link To Document :
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