DocumentCode :
1668834
Title :
Influence of the Pt cathode resistance on the field emission properties of field emitters fabricated using beam induced deposition
Author :
Murakami, K. ; Yamasaki, N. ; Abe, S. ; Tsukatani, Y. ; Abo, S. ; Wakaya, F. ; Takai, M.
Author_Institution :
Res. Center for Mater. Sci. at Extreme Conditions, Osaka Univ., Japan
fYear :
2005
Firstpage :
246
Lastpage :
247
Abstract :
The influence of the Pt cathode resistance on the field emission properties of field emitters fabricated using electron- or focused-ion beam induced deposition is investigated. In the case of the as deposited Pt field emitters, the slope of Fowler-Nordheim plot changes at a gate voltage of 55 V. On the other hand, the field emitters with annealing does not show the change in the slope of the FN plots. The I-V curve of the unannealed emitters could be fitted to the theoretical curve calculated from the FN theory by the compensation resistance of 1.6 MΩ. It indicates that this slope change is caused by the voltage drop due to the resistance of the field emitter itself.
Keywords :
annealing; cathodes; electron beam deposition; electron field emission; focused ion beam technology; platinum; 1.6 Mohm; 55 V; Fowler-Nordheim plot; Pt; annealing; beam induced deposition; cathode resistance; compensation resistance; field emission properties; gate voltage; Annealing; Atmosphere; Cathodes; Electrodes; Gold; Leakage current; Nanowires; Sputtering; Voltage; Wires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
Print_ISBN :
0-7803-8397-4
Type :
conf
DOI :
10.1109/IVNC.2005.1619578
Filename :
1619578
Link To Document :
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