Influence of the Pt cathode resistance on the field emission properties of field emitters fabricated using beam induced deposition

Author

Murakami, K. ; Yamasaki, N. ; Abe, S. ; Tsukatani, Y. ; Abo, S. ; Wakaya, F. ; Takai, M.

Author_Institution

Res. Center for Mater. Sci. at Extreme Conditions, Osaka Univ., Japan

fYear

2005

Firstpage

246

Lastpage

247

Abstract

The influence of the Pt cathode resistance on the field emission properties of field emitters fabricated using electron- or focused-ion beam induced deposition is investigated. In the case of the as deposited Pt field emitters, the slope of Fowler-Nordheim plot changes at a gate voltage of 55 V. On the other hand, the field emitters with annealing does not show the change in the slope of the FN plots. The I-V curve of the unannealed emitters could be fitted to the theoretical curve calculated from the FN theory by the compensation resistance of 1.6 MΩ. It indicates that this slope change is caused by the voltage drop due to the resistance of the field emitter itself.

Keywords

annealing; cathodes; electron beam deposition; electron field emission; focused ion beam technology; platinum; 1.6 Mohm; 55 V; Fowler-Nordheim plot; Pt; annealing; beam induced deposition; cathode resistance; compensation resistance; field emission properties; gate voltage; Annealing; Atmosphere; Cathodes; Electrodes; Gold; Leakage current; Nanowires; Sputtering; Voltage; Wires;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International

Print_ISBN

0-7803-8397-4

Type

conf

DOI

10.1109/IVNC.2005.1619578

Filename

1619578