Fabrication of dimension-tunable Si nanopillar arrays with antireflection and self-cleaning properties

In the present work, the SWSs combining AR and enhanced hydrophobic effects was reported. A simple method, which combines sub-wavelength-scale monolayer spheres with a reactive ion etching process, to fabricate AR structures of Si nanorod arrays (NRAs) was used. Spectral reflectance measurements of Si substrates with NRA SWSs showed drastic reduction in reflection over a broad range of wavelengths and a wide range of angle of incidence, demonstrating its ability to broadband and omnidirectional antireflection. The reflectivity and the wettability as a function of diameter, height, of Si NWAs were discussed.