Title :
Positioning loads within the nanometer scale the mechatronic way to do it
Author_Institution :
Inspire/IWF, ETH Zurich, Zurich, Switzerland
Abstract :
The semiconductor- and the new growing up micro and nano manufacturing industry needs more and more precise drive systems with a high accuracy positioning behavior for their production. For example to inspect wavers of the new 32/28 nm Clarkdale and Arandale Chip series from Intel, waver inspection systems are required which stabilizes the moved waver within a 3-dimensional cube of 10nm. The new 22/20 nm processor technology, where the volume production will start in 2012 - 2013, will increase the demands of such systems once more to stabilize within a cube of 5 to 6 nm. To fulfill the demands of such processes concerning the desired accuracy, the whole mechatronic chain of a drive system must be considered carefully. This talk will focus on the actual research and on the design of high accuracy positioning drives which are able to position loads within the nanometer scale. Linear motors, voice coils, piezo´s and the “new” types of actuators are considered to drive such systems. The special needs regarding the amplifiers and the linear bearings such as air cushions are highlighted. Different controller concepts will be discussed and compared together. The presented examples include an inspection system for waver inspection, a laser focusing system as well as a laser wave length stabilizing system.
Keywords :
design engineering; inspection; laser beam applications; linear motors; mechatronics; micromechanics; nanopositioning; piezoelectric actuators; semiconductor industry; 3-dimensional cube; Intel; laser focusing system; laser wavelength stabilizing system; linear bearing; linear motor; mechatronics; micro manufacturing industry; nano manufacturing industry; nanopositioning; piezoactuator; positioning drive; semiconductor-manufacturing industry; size 20 nm to 22 nm; waver inspection system;
Conference_Titel :
Micro-NanoMechatronics and Human Science (MHS), 2010 International Symposium on
Conference_Location :
Nagoya
Print_ISBN :
978-1-4244-7995-5
DOI :
10.1109/MHS.2010.5669590