• DocumentCode
    1669270
  • Title

    Synthesis and characterization of templated Si-based nanowires via vapor-liquid-solid (VLS) growth for electrical transport

  • Author

    Lee, Jae Ho ; Lund, Isaac N. ; Eisenbraun, Eric T. ; Xue, Yongqiang ; Geer, Robert E.

  • Author_Institution
    Coll. of Nanoscale Sci. & Eng., Univ. at Albany-SUNY, Albany, NY, USA
  • fYear
    2010
  • Firstpage
    1140
  • Lastpage
    1141
  • Abstract
    Nanowire surface conduction channels have been fabricated and tested based on self-assembled Si nanowires (SiNWs) synthesized via VLS processing. Conduction channel formation utilized W and Ni silicidation. SiNWs were directly grown on silicon substrates via vapor-liquid-solid (VLS) growth process. The diameters of the SiNW templates ranged from approximately 5 to 120 nm. Nanowire synthesis via VLS growth was carried out using a SiH4/Ar mixture at 500°C. TEM analysis confirmed crystalline VLS SiNWs. Ni evaporation and Ni and W atomic layer deposition (ALD) and post-deposition thermal processing were carried out for silicide formation. TEM-EDS results showed that ALD W was conformally deposited on the surface of SiNWs. In contrast, e-beam evaporated Ni was asymmetrically deposited on the template nanowire although the resultant silicide was nearly symmetric. Conformal Ni deposition and silicidation was successfully performed, however, using Ni ALD processing. Silicide nanowires were dispensed on Au-patterned Si wafers for electrical characterization and exhibited an improvement in electrical conductivity of eight orders of magnitude compared with that of as-grown VLS silicon nanowires.
  • Keywords
    argon; atomic layer deposition; electrical conductivity; nanowires; nickel; self-assembly; silicon; substrates; transmission electron microscopy; tungsten; Ni; Si; SiH4-Ar; TEM analysis; W; atomic layer deposition; conformal Ni deposition; electrical conductivity; electrical transport; post-deposition thermal processing; self-assembled Si nanowires; silicidation; silicon substrates; surface conduction channels; temperature 500 degC; templated Si-based nanowires; vapor-liquid-solid growth; Argon; Atomic layer deposition; Automatic testing; Conductivity; Crystallization; Nanowires; Self-assembly; Silicidation; Silicides; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference (INEC), 2010 3rd International
  • Conference_Location
    Hong Kong
  • Print_ISBN
    978-1-4244-3543-2
  • Electronic_ISBN
    978-1-4244-3544-9
  • Type

    conf

  • DOI
    10.1109/INEC.2010.5424988
  • Filename
    5424988