• DocumentCode
    1669491
  • Title

    A unified drain current model for nanoscale double-gate and surrounding-gate MOSFETs incorporating velocity saturation

  • Author

    Zhang, Lining ; Zhou, Xingye ; Xu, Yiwen ; Chen, Lin ; Zhou, Wang ; Li, Yingxue ; He, Frank ; Chan, Mansun

  • Author_Institution
    Key Lab. of Integrated Microsyst., Peking Univ. Shenzhen Grad. Sch., Shenzhen, China
  • fYear
    2010
  • Firstpage
    1130
  • Lastpage
    1131
  • Abstract
    A unified drain current model for undoped or lightly doped double-gate (DG) and surrounding-gate (SRG) MOSFETs incorporating velocity saturation effect are presented in this paper. The unified charge-based core model for undoped or lightly doped DG and SRG MOSFETs is presented first. Caughey-Thomas engineering mobility model with exponent factor n=2 is then integrated self-consistently into the unified drain current model derivation of the two device structure. Extensive two dimensional (2D) and three dimensional (3D) device simulations are performed to validate the proposed model. Symmetry property of the proposed unified current model is obtained with the exponent factor n=2 in Cauhey-Thomas Model.
  • Keywords
    MOSFET; circuit simulation; Caughey-Thomas engineering mobility model; nanoscale double-gate MOSFET; surrounding-gate MOSFET; three dimensional device simulation; two dimensional device simulation; unified charge-based core model; unified drain current model; velocity saturation; Electron devices; Electrostatics; Geometry; Helium; Integrated circuit modeling; MOSFETs; Nanoscale devices; Semiconductor device modeling; Solid modeling; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference (INEC), 2010 3rd International
  • Conference_Location
    Hong Kong
  • Print_ISBN
    978-1-4244-3543-2
  • Electronic_ISBN
    978-1-4244-3544-9
  • Type

    conf

  • DOI
    10.1109/INEC.2010.5424994
  • Filename
    5424994