DocumentCode :
1669689
Title :
Enhanced field emission from carbon nanotube films by hydrogen glow discharge treatment
Author :
Liang, X.H. ; Xu, N.S. ; Chen, Jun ; Deng, S.Z.
Author_Institution :
State Key Lab. of Optoelectron. Mater. & Technol., Sun Yat-sen Univ., Guangzhou, China
fYear :
2005
Firstpage :
302
Lastpage :
303
Abstract :
Carbon nanotube (CNT) films are treated by a direct current hydrogen glow discharge treatment under different discharge condition. It is found that the influence of hydrogen pressure is very important in our setup.
Keywords :
carbon nanotubes; electron field emission; glow discharges; plasma materials processing; thin films; C; carbon nanotube films; direct current hydrogen glow discharge treatment; enhanced field emission; hydrogen pressure; Carbon nanotubes; Current density; Glow discharges; Hydrogen; Organic materials; Plasma materials processing; Plasma properties; Plasma temperature; Scanning electron microscopy; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
Print_ISBN :
0-7803-8397-4
Type :
conf
DOI :
10.1109/IVNC.2005.1619606
Filename :
1619606
Link To Document :
بازگشت