DocumentCode
1669710
Title
Fabrication of two-dimensional multiscale patterns by holographic lithography
Author
Moon, Jun Hyuk ; Jin, Woo-Min ; Shin, Ju-Hwan ; Yang, Shu
Author_Institution
Dept. of Chem. & Biomol. Eng., Sogang Univ., Seoul, South Korea
fYear
2010
Firstpage
525
Lastpage
526
Abstract
We present a holographic lithography for multiscale patterning. The multiscale pattern generation was achieved by the multiple exposure of interference pattern with various periods and dimensions. Furthermore, the pattern was used as a mask for reactive-ion etching of the silicon substrate.
Keywords
elemental semiconductors; holography; lithography; masks; nanofabrication; nanopatterning; silicon; sputter etching; substrates; 2D multiscale patterns; Si; holographic lithography; interference pattern; mask; multiple exposure; multiscale pattern generation; reactive ion etching; silicon substrate; Etching; Fabrication; Holographic optical components; Holography; Interference; Laser beams; Lithography; Pattern formation; Resists; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location
Hong Kong
Print_ISBN
978-1-4244-3543-2
Electronic_ISBN
978-1-4244-3544-9
Type
conf
DOI
10.1109/INEC.2010.5425003
Filename
5425003
Link To Document