DocumentCode :
1670052
Title :
Efficient model for delay estimation of MWCNT interconnects
Author :
Gholipour, Morteza ; Masoumi, Nasser
Author_Institution :
Adv. VLSI Lab., Univ. of Tehran, Tehran, Iran
fYear :
2011
Firstpage :
1
Lastpage :
4
Abstract :
This paper investigates different aspects of the use of MWCNTs as chip interconnects. Simulations were made to compare the performance of MWCNT and Cu at global, intermediate and local interconnect levels. We studied the effect of different geometry parameters of MWCNT on its propagation delay, and introduced a semi-analytical model to estimate its propagation delay. We deployed this model to study the buffer insertion technique in MWCNT interconnects. Simulation results confirm the accuracy and efficiency of the model compared to equivalent circuit model of MWCNT. The results also show that the MWCNT interconnect requires lower buffer numbers compared to Cu wire.
Keywords :
carbon nanotubes; copper; delay estimation; integrated circuit interconnections; C; Cu; Cu interconnect level; MWCNT interconnects; buffer insertion; buffer numbers; chip interconnects; delay estimation; global interconnect level; intermediate interconnect level; local interconnect level; propagation delay; semianalytical model; Carbon nanotubes; Copper; Delay; Equivalent circuits; Integrated circuit interconnections; Integrated circuit modeling; Resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronics (ICM), 2011 International Conference on
Conference_Location :
Hammamet
Print_ISBN :
978-1-4577-2207-3
Type :
conf
DOI :
10.1109/ICM.2011.6177375
Filename :
6177375
Link To Document :
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