Title :
Interest of surface treatment at gate oxide level for power MOSFETs quality and reliability
Author :
Pomès, Emilie ; Reynès, Jean-Michel ; Tounsi, Patrick ; Dorkel, Jean-Marie
Author_Institution :
LAAS, Toulouse, France
Abstract :
In this paper, the impact of pre-gate and post-gate oxide surface treatments on the reliability and the robustness of low power vertical MOSFET dedicated to automotive applications are investigated. In these applications, components quality is linked with gate oxide robustness and tests like Qbd, TDDB and HTGB exist to evaluate its reliability. The study concludes that post-gate oxide cleaning has a significant impact on oxide quality as shown with Qbd on final product and GOI measurements. Moreover, an AFM characterization has demonstrated that a mechanical ultrasonic cleaning step can damage irreversibly gate oxide surface roughness in opposition to chemical surface treatment. Nevertheless, the TEM analysis of oxide-polysilicon interface does not highlight any difference. The root cause of power MOSFET failure mechanism is linked with gate oxide quality which depends to surface treatment performed. The cavitation erosion phenomenon has been highlighted to be responsible for Qbd degradation.
Keywords :
atomic force microscopy; automotive electronics; low-power electronics; power MOSFET; semiconductor device reliability; semiconductor device testing; surface cleaning; transmission electron microscopy; AFM characterization; GOI measurements; HTGB test; Qbd degradation; Qbd test; TDDB test; TEM analysis; atomic force microscopy; automotive applications; cavitation erosion phenomenon; chemical surface treatment; component quality; gate oxide level; gate oxide quality; gate oxide robustness; gate oxide surface roughness; low-power vertical MOSFET; mechanical ultrasonic cleaning step; oxide-polysilicon interface; post-gate oxide cleaning; post-gate oxide surface treatment; power MOSFET failure mechanism; power MOSFET quality; power MOSFET reliability; pre-gate oxide surface treatment; transmission electron microscopy; Chemicals; Cleaning; Logic gates; MOSFETs; Reliability; Surface roughness; Surface treatment; AFM; Qbd; TEM; cleaning (surface treatment); oxide; power MOSFETs; reliability;
Conference_Titel :
Microelectronics (ICM), 2011 International Conference on
Conference_Location :
Hammamet
Print_ISBN :
978-1-4577-2207-3
DOI :
10.1109/ICM.2011.6177390