• DocumentCode
    1670558
  • Title

    Single mask fabrication process of vacuum microelectronics components and preliminary characterization results

  • Author

    Phommahaxay, Alain ; Lissorgues, Gaelle ; Bourouina, Tank ; Nicole, Pierre

  • Author_Institution
    ESIEE-ESYCOM, Noisy-le-Grand, France
  • fYear
    2005
  • Firstpage
    368
  • Lastpage
    369
  • Abstract
    In using a single mask fabrication process, our work enables the rapid prototyping of vacuum micro-components. The first prototypes, including lateral diodes and triodes, have been produced with a low-cost aluminum process, consisting of one metal layer, one lithography step and silicon micromachining. The effects of the process optimization on the characteristics will be assessed. Different configurations using more suitable field emitter materials such as tungsten will be studied in the future.
  • Keywords
    aluminium; diodes; lithography; masks; micromachining; rapid prototyping (industrial); triodes; vacuum microelectronics; Al-Si; diodes; lithography; micromachining; rapid prototyping; single mask fabrication process; triodes; vacuum microelectronics components; Aluminum; Electrodes; Etching; Fabrication; Lithography; Microelectronics; Micromachining; Optical interferometry; Prototypes; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
  • Print_ISBN
    0-7803-8397-4
  • Type

    conf

  • DOI
    10.1109/IVNC.2005.1619639
  • Filename
    1619639