Title :
Single mask fabrication process of vacuum microelectronics components and preliminary characterization results
Author :
Phommahaxay, Alain ; Lissorgues, Gaelle ; Bourouina, Tank ; Nicole, Pierre
Author_Institution :
ESIEE-ESYCOM, Noisy-le-Grand, France
Abstract :
In using a single mask fabrication process, our work enables the rapid prototyping of vacuum micro-components. The first prototypes, including lateral diodes and triodes, have been produced with a low-cost aluminum process, consisting of one metal layer, one lithography step and silicon micromachining. The effects of the process optimization on the characteristics will be assessed. Different configurations using more suitable field emitter materials such as tungsten will be studied in the future.
Keywords :
aluminium; diodes; lithography; masks; micromachining; rapid prototyping (industrial); triodes; vacuum microelectronics; Al-Si; diodes; lithography; micromachining; rapid prototyping; single mask fabrication process; triodes; vacuum microelectronics components; Aluminum; Electrodes; Etching; Fabrication; Lithography; Microelectronics; Micromachining; Optical interferometry; Prototypes; Silicon;
Conference_Titel :
Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
Print_ISBN :
0-7803-8397-4
DOI :
10.1109/IVNC.2005.1619639