DocumentCode
1670558
Title
Single mask fabrication process of vacuum microelectronics components and preliminary characterization results
Author
Phommahaxay, Alain ; Lissorgues, Gaelle ; Bourouina, Tank ; Nicole, Pierre
Author_Institution
ESIEE-ESYCOM, Noisy-le-Grand, France
fYear
2005
Firstpage
368
Lastpage
369
Abstract
In using a single mask fabrication process, our work enables the rapid prototyping of vacuum micro-components. The first prototypes, including lateral diodes and triodes, have been produced with a low-cost aluminum process, consisting of one metal layer, one lithography step and silicon micromachining. The effects of the process optimization on the characteristics will be assessed. Different configurations using more suitable field emitter materials such as tungsten will be studied in the future.
Keywords
aluminium; diodes; lithography; masks; micromachining; rapid prototyping (industrial); triodes; vacuum microelectronics; Al-Si; diodes; lithography; micromachining; rapid prototyping; single mask fabrication process; triodes; vacuum microelectronics components; Aluminum; Electrodes; Etching; Fabrication; Lithography; Microelectronics; Micromachining; Optical interferometry; Prototypes; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
Print_ISBN
0-7803-8397-4
Type
conf
DOI
10.1109/IVNC.2005.1619639
Filename
1619639
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