DocumentCode :
1670714
Title :
The analysis of X-Ray diffraction by Al3+ implanted Polytetrafluorethylene
Author :
Zhao, Yuan ; Tang, Hui ; Wang, Feng C.
Author_Institution :
Sch. of Mater. Sci. & Eng., Harbin Univ. of Sci. & Technol., Harbin, China
fYear :
2010
Firstpage :
1061
Lastpage :
1062
Abstract :
Elastic-metal pads (EMP) were implanted by low energy aluminum ion in a metal vapor vacuum arc (MEVVA) implanter. The samples were irradiated by 20 keV Al ions with various dosages from 1 × 1015 to 1 × 1016 Al/cm2. Through the detailed analysis of X-ray diffraction by before and after implanted samples, some changes in microstructures between before and after implanted samples have been found, which will be the basic data of the further research. The results of XRD analysis show that: with augmenting the dose of Al3+, elastic modulus(E) of samples increase, the sizes of crystallites decrease, and the crystallinity get some small drop; after implantation, crystal lattice distortions were caused and inner-distortions of crystal grating play the main role even the distortions among crystallites increase with the increasing of the dose, also, some mechanisms of the properties improvement of Polytetrafluorethylene by Aluminum ions implantation were discussed according to these results.
Keywords :
X-ray diffraction; aluminium; elastic moduli; ion implantation; Al; MEVVA implanter; X-ray diffraction; XRD analysis; crystal grating; crystal lattice distortions; crystallinity; crystallites; elastic modulus; elastic-metal pads; electron volt energy 20 keV; implanted samples; low energy aluminum ion; metal vapor vacuum arc; microstructures; polytetrafluorethylene; Aluminum; Crystal microstructure; Crystallization; EMP radiation effects; Elementary particle vacuum; Gratings; Lattices; Vacuum arcs; X-ray diffraction; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-3543-2
Electronic_ISBN :
978-1-4244-3544-9
Type :
conf
DOI :
10.1109/INEC.2010.5425036
Filename :
5425036
Link To Document :
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