DocumentCode :
1670746
Title :
The effects of bi-layer catalysts and its annealing on the growth of GaN nanowires
Author :
Kuo, Dong-Hau ; Shen, Wei-Ting
Author_Institution :
Dept. of Polymer Eng., Nat. Taiwan Univ. of Sci. & Technol., Taipei, Taiwan
fYear :
2010
Firstpage :
1064
Lastpage :
1065
Abstract :
We report an evaporation reaction to synthesize GaN nanowires at 800°C on metallic bi-layer catalyst-coated substrates and on the bi-layer catalyst-annealed substrates through the reaction of GaN and NH3. The annealing temperatures of catalyst layers before the GaN growth were 700°C and 850°C. Bi-layer metallic catalysts were constituted with Au, Ni, Al, and In. The growth differences caused by the stacking sequence of bi-layer catalysts and the annealing conditions were investigated. The understanding of those differences can help to know the growth mechanism.
Keywords :
III-V semiconductors; annealing; catalysts; evaporation; gallium compounds; nanowires; semiconductor growth; wide band gap semiconductors; GaN; annealing; bilayer catalyst; evaporation reaction; nanowire growth; stacking sequence; temperature 700 degC; temperature 800 degC; temperature 850 degC; Alloying; Annealing; Carbon nanotubes; Gallium nitride; Gold; Nanowires; Stacking; Substrates; Surface cleaning; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-3543-2
Electronic_ISBN :
978-1-4244-3544-9
Type :
conf
DOI :
10.1109/INEC.2010.5425038
Filename :
5425038
Link To Document :
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