Study of a MEMS gyroscope sensing unit simulate and process

This paper reports a MEMS gyroscope that is driven by the rotating carrier´s angular velocity. The structure and fabrication are introduced in the paper. The silicon processing and simulating of the sensing unit are studied. We use coventor ware to simulate structure. And in process, we use spray coating instead of spinning coating. In simulation, the first modal frequency we obtained is 220.38Hz, it is nearly we calculated. A conformal resist of 3μm thickness is obtained at 35mm Z-height, 100mm/min travel rate, 3ml/min flow rate. In step surface coating it gets more uniform thickness that associates with line width, a better line width would get a more precise pattern. Thus, it provides an opportunity of a precision patterning on a wafer.