• DocumentCode
    1672368
  • Title

    Fabrication and characterization of co-sputtering Au/SiO2 thin films prepared by RF magnetron sputtering

  • Author

    Aspanut, Z. ; Wah, C.K. ; Kong, C.S. ; Ritikos, R. ; Tong, G.B. ; Rahman, S.A. ; Muhammad, M.R.

  • Author_Institution
    Dept. of Phys., Univ. of Malaya, Kuala Lumpur, Malaysia
  • fYear
    2010
  • Firstpage
    970
  • Lastpage
    971
  • Abstract
    An amorphous silicon suboxide was synthesized by co-sputtering of Au and SiO2 using RF magnetron sputtering. The extracted data from XRD, SEM as well as EDX were utilized to characterize the surface of the thin film samples.
  • Keywords
    X-ray chemical analysis; X-ray diffraction; amorphous semiconductors; gold; scanning electron microscopy; semiconductor thin films; silicon compounds; sputter deposition; Au-SiO2; EDX; RF magnetron sputtering; SEM; XRD; amorphous silicon suboxide; co-sputtering; semiconductor thin films; Amorphous magnetic materials; Annealing; Copper; Fabrication; Gold; Nanoparticles; Optical films; Radio frequency; Sputtering; Surface morphology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference (INEC), 2010 3rd International
  • Conference_Location
    Hong Kong
  • Print_ISBN
    978-1-4244-3543-2
  • Electronic_ISBN
    978-1-4244-3544-9
  • Type

    conf

  • DOI
    10.1109/INEC.2010.5425097
  • Filename
    5425097