DocumentCode :
1672368
Title :
Fabrication and characterization of co-sputtering Au/SiO2 thin films prepared by RF magnetron sputtering
Author :
Aspanut, Z. ; Wah, C.K. ; Kong, C.S. ; Ritikos, R. ; Tong, G.B. ; Rahman, S.A. ; Muhammad, M.R.
Author_Institution :
Dept. of Phys., Univ. of Malaya, Kuala Lumpur, Malaysia
fYear :
2010
Firstpage :
970
Lastpage :
971
Abstract :
An amorphous silicon suboxide was synthesized by co-sputtering of Au and SiO2 using RF magnetron sputtering. The extracted data from XRD, SEM as well as EDX were utilized to characterize the surface of the thin film samples.
Keywords :
X-ray chemical analysis; X-ray diffraction; amorphous semiconductors; gold; scanning electron microscopy; semiconductor thin films; silicon compounds; sputter deposition; Au-SiO2; EDX; RF magnetron sputtering; SEM; XRD; amorphous silicon suboxide; co-sputtering; semiconductor thin films; Amorphous magnetic materials; Annealing; Copper; Fabrication; Gold; Nanoparticles; Optical films; Radio frequency; Sputtering; Surface morphology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-3543-2
Electronic_ISBN :
978-1-4244-3544-9
Type :
conf
DOI :
10.1109/INEC.2010.5425097
Filename :
5425097
Link To Document :
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