DocumentCode
1672368
Title
Fabrication and characterization of co-sputtering Au/SiO2 thin films prepared by RF magnetron sputtering
Author
Aspanut, Z. ; Wah, C.K. ; Kong, C.S. ; Ritikos, R. ; Tong, G.B. ; Rahman, S.A. ; Muhammad, M.R.
Author_Institution
Dept. of Phys., Univ. of Malaya, Kuala Lumpur, Malaysia
fYear
2010
Firstpage
970
Lastpage
971
Abstract
An amorphous silicon suboxide was synthesized by co-sputtering of Au and SiO2 using RF magnetron sputtering. The extracted data from XRD, SEM as well as EDX were utilized to characterize the surface of the thin film samples.
Keywords
X-ray chemical analysis; X-ray diffraction; amorphous semiconductors; gold; scanning electron microscopy; semiconductor thin films; silicon compounds; sputter deposition; Au-SiO2; EDX; RF magnetron sputtering; SEM; XRD; amorphous silicon suboxide; co-sputtering; semiconductor thin films; Amorphous magnetic materials; Annealing; Copper; Fabrication; Gold; Nanoparticles; Optical films; Radio frequency; Sputtering; Surface morphology;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location
Hong Kong
Print_ISBN
978-1-4244-3543-2
Electronic_ISBN
978-1-4244-3544-9
Type
conf
DOI
10.1109/INEC.2010.5425097
Filename
5425097
Link To Document