Title :
Deep sub-wavelength plasmonic lithography with antisymmetric surface plasmon mode
Author :
Zhu, Peng ; Guo, L. Jay
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Univ. of Michigan, Ann Arbor, MI, USA
Abstract :
We propose a method for deep-subwavelength patterns using antisymmetric surface plasmon mode in metal/dielectric multilayer metamaterials. Interference patterns with feature size of 22nm(~λincident/20) and fabrication of the device are demonstrated.
Keywords :
metal-insulator boundaries; metamaterials; photolithography; plasmonics; surface plasmons; antisymmetric surface plasmon mode; deep sub wavelength plasmonic lithography; metal-dielectric multilayer metamaterial; Gratings; Interference; Lithography; Metals; Nonhomogeneous media; Plasmons; Resists;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2012 Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4673-1839-6
