Title :
Magnetoresistance effect and magnetic properties of strain induced Co/Cu multilayer films
Author :
Rizal, C. ; Ueda, Y.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of British Columbia, Vancouver, BC, Canada
Abstract :
We have produced Co(tCo)/Cu multilayer and alloy films on a polyimide substrate (1 cm2) with layers grown in the atomic scale using a pulse generator circuit. The induced uniaxial magnetic anisotropy was observed due to the effect of strain in all the multilayer films. The multilayer [Co 1.0 nm/Cu 1.5 nm]50 showed a minimum hysteresis loss. The maximum magnetoresistance (MR) ratio observed was 3.4% at 1 kOe. A remarkable difference of the magnetic field dependence of the MR ratio was observed corresponding to the orientation of the magnetization curves.
Keywords :
cobalt; copper; ferromagnetic materials; magnetic anisotropy; magnetic hysteresis; magnetic multilayers; magnetic thin films; magnetoresistance; Co-Cu; alloy films; hysteresis loss; induced uniaxial magnetic anisotropy; magnetic properties; magnetization curve orientation; magnetoresistnace ratio; polyimide substrate; pulse generator circuit; size 1 nm; size 1.5 nm; strain induced multilayer films; Atomic layer deposition; Circuits; Copper alloys; Magnetic field induced strain; Magnetic films; Magnetic multilayers; Magnetic properties; Magnetoresistance; Polyimides; Pulse generation;
Conference_Titel :
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-3543-2
Electronic_ISBN :
978-1-4244-3544-9
DOI :
10.1109/INEC.2010.5425119
