DocumentCode :
1673112
Title :
A silicon bipolar technology for high-efficiency power applications up to C-band
Author :
Biondi, Tonio ; Carrara, Francesco ; Scuderi, Antonino ; Palmisano, Giuseppe
Author_Institution :
DIEES, Universita di Catania, Italy
fYear :
2003
Firstpage :
155
Lastpage :
158
Abstract :
This paper presents the large-signal characterization and modeling of a 0.8-μm 46-GHz-fT silicon bipolar technology for RF power applications up to C-band. A series of devices with optimized layout and vertical structure was fabricated for on-wafer load-pull testing at 1.9 GHz, 2.4 GHz, and 5.2 GHz. Under continuous-wave operation, a 56% power-added efficiency and 11-dB large-signal gain were achieved at a 22-dBm output power level by an 80-μm emitter length device (180-μm2 emitter area) operating at 5.2 GHz with a 2.7-V supply voltage. A modified Gummel-Poon model was extracted from DC and multibias S-parameter measurements and validated by comparisons with load-pull results. Close agreement was found between simulated and measured large-signal performance up to power levels well above the 1-dB compression point.
Keywords :
S-parameters; UHF integrated circuits; UHF power amplifiers; bipolar analogue integrated circuits; 0.8 micron; 1.9 GHz; 11 dB; 2.4 GHz; 2.7 V; 5.2 GHz; 56 percent; C-band; Gummel-Poon model; RF power amplifier; S-parameter; Si; continuous-wave operation; large-signal gain; on-wafer load-pull testing; output power; power-added efficiency; silicon bipolar technology; Integrated circuit technology; Isolation technology; MOSFETs; Power generation; Power measurement; Power system harmonics; Radio frequency; Radiofrequency amplifiers; Silicon; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Radio Frequency Integrated Circuits (RFIC) Symposium, 2003 IEEE
ISSN :
1529-2517
Print_ISBN :
0-7803-7694-3
Type :
conf
DOI :
10.1109/RFIC.2003.1213915
Filename :
1213915
Link To Document :
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