• DocumentCode
    1673901
  • Title

    Nanowire field effect transistor with its sub-picomolar label-free biosensing capability toward a gene mutation

  • Author

    Wu, Chi-Chang ; Ko, Fu-Hsiang ; Su, Ting-Siang ; Li, Bo-Syuan ; Wu, Wen-Fa

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
  • fYear
    2010
  • Firstpage
    872
  • Lastpage
    873
  • Abstract
    We describe the efficiency of deoxyribonucleic acid (DNA) immobilization onto a nanowire (NW) after employing various surface cleaning methods. From surface tension measurements and fluorescence microscopy images of the silicon oxide surfaces, we determined that the effectiveness of surface cleaning using an acetone/ethanol mixture was similar to that of piranha solution (sulfuric acid/hydrogen peroxide). Thus, we employed surface cleaning with an acetone/ethanol mixture en route toward the fabrication of a series of label-free, back-gated, 60-nm nanowire field-effect transistor (NWFET) sensors for the detection of the BRAFV599E oncogene. We applied the NWFET sensor to the successful detection of the hybridization and dehybridization processes of the BRAFV599E mutation gene.
  • Keywords
    DNA; biological techniques; biosensors; elemental semiconductors; field effect transistors; genetics; nanobiotechnology; nanosensors; nanowires; silicon; surface cleaning; surface contamination; surface tension; BRAFV599E mutation gene; DNA; NWFET sensor; Si; SiO2; acetone-ethanol mixture; dehybridization; deoxyribonucleic acid immobilization; fluorescence microscopy images; hybridization; nanowire field effect transistor; piranha solution; silicon oxide surfaces; subpicomolar label-free biosensing capability; sulfuric acid-hydrogen peroxide; surface cleaning methods; surface tension measurements; Biosensors; DNA; Ethanol; FETs; Fluorescence; Genetic mutations; Microscopy; Silicon; Surface cleaning; Surface tension;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference (INEC), 2010 3rd International
  • Conference_Location
    Hong Kong
  • Print_ISBN
    978-1-4244-3543-2
  • Electronic_ISBN
    978-1-4244-3544-9
  • Type

    conf

  • DOI
    10.1109/INEC.2010.5425155
  • Filename
    5425155