Title :
ITO, Si3N4 and ZnO:Al -- Simulation of Different Anti-reflection Coatings (ARC) for Thin Film a-Si:H Solar Cells
Author :
Islam, Kaidul ; Alnuaimi, Aaesha ; Ally, H. ; Nayfeh, Ammar
Author_Institution :
Microsyst. Eng., Masdar Inst. of Sci. & Technol., Abu Dhabi, United Arab Emirates
Abstract :
For thin film solar cells incorporating amorphous silicon (a-Si:H) as absorber materials, minimizing reflection from the top surface i.e. maximizing transmittance of the incoming light into the absorber for higher absorption plays an important role for the overall device performance. This paper discusses ways to minimize reflection using different anti-reflection coatings (ARC) at the top surface of the solar cell. Focus of this paper is to study the effect of ITO, Si3N4 and ZnO:Al as ARC on thin film aSi:H n-i-p solar cells. The influences of electrical and optical properties of the said materials are modeled using Sentaurus TCAD. Results suggest that 60 nm Si3N4 proves to be the best ARC among the studied three and a very thin layer of ZnO:Al e.g. 20 nm can also be effective.
Keywords :
II-VI semiconductors; absorption; aluminium; amorphous semiconductors; antireflection coatings; elemental semiconductors; hydrogen; indium compounds; optical properties; semiconductor thin films; silicon; silicon compounds; solar cells; tin compounds; wide band gap semiconductors; zinc compounds; ARC; ITO; Sentaurus TCAD; Si:H; Si3N4; ZnO:Al; absorber materials; amorphous silicon; antireflection coatings; electrical properties; optical properties; size 20 nm; size 60 nm; thin film n-i-p solar cells; transmittance maximization; Coatings; Films; Indium tin oxide; Photovoltaic cells; Refractive index; Silicon; ARC; ITO; Si3N4; Solar cell; TCO; ZnO:Al;
Conference_Titel :
Modelling Symposium (EMS), 2013 European
Conference_Location :
Manchester
Print_ISBN :
978-1-4799-2577-3
DOI :
10.1109/EMS.2013.112