DocumentCode
1678490
Title
Development of a powerful vortex stabilized waterwall flash lamp for RTP applications
Author
Thrum, T. ; Camm, D. ; Dets, S. ; Hewett, A. ; Rudic, I. ; Stuart, G.C. ; Viel, A.
Author_Institution
Vortek Industries Ltd., Vancouver, BC, Canada
Volume
2
fYear
2004
Firstpage
1019
Abstract
A 300 mm long flash lamp based on a water-vortex stabilized high-pressure high-power arc lamp has been developed to meet future requirements in semiconductor rapid thermal processing. This flash lamp is much more powerful than any other commercially available flash lamp. Typical operating parameters are peak currents of up to 50 kA and pulse widths in the order of 0.5 to 2 ms FWHM.
Keywords
arc lamps; flash lamps; rapid thermal processing; semiconductor technology; 0.5 to 2 ms; 300 mm; RTP applications; peak currents; semiconductor rapid thermal processing; water-vortex stabilized high-pressure high-power arc lamp; Annealing; Lamps; Plasma applications; Plasma devices; Plasma temperature; Rapid thermal processing; Silicon; Space vector pulse width modulation; Surface discharges; Switches;
fLanguage
English
Publisher
ieee
Conference_Titel
Industry Applications Conference, 2004. 39th IAS Annual Meeting. Conference Record of the 2004 IEEE
ISSN
0197-2618
Print_ISBN
0-7803-8486-5
Type
conf
DOI
10.1109/IAS.2004.1348538
Filename
1348538
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