DocumentCode :
1684782
Title :
Spatial Profiles Of Plasma Properties In Planar Rf Inductive Discharges - 1) Role Of Chamber Length And 2) Anisotropy Of Electron Velocity Distributions
Author :
Mahoney, L.J. ; Wendt, A.E. ; Shohet, J.I.
Author_Institution :
University of Wisconsin
fYear :
1994
Firstpage :
107
Lastpage :
107
Keywords :
Electrons; Plasma applications; Plasma density; Plasma materials processing; Plasma measurements; Plasma properties; Plasma temperature; Plasma transport processes; Probes; Radio frequency;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1994. Conference Record - Abstracts., 1994 IEEE International Conference on
Conference_Location :
Santa Fe, NM, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-2006-9
Type :
conf
DOI :
10.1109/PLASMA.1994.588784
Filename :
588784
Link To Document :
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