Title :
Modeling and process design for laser interference lithography used in fabricating two-dimensional periodic structures
Author :
Bostan, C.G. ; de Ridder, R.M. ; van Dorssen, I. ; van Wolferen, H. ; Kuipers, L. ; van Hulst, N.F.
Author_Institution :
Lightwave Devices Group, Twente Univ., Enschede, Netherlands
fDate :
6/24/1905 12:00:00 AM
Abstract :
Laser interference lithography (LIL) is a technique that can be successfully used for realization of 2D periodic structures, with excellent uniformity over large areas. However, detailed modeling is needed in order to extract the optimum design parameters. In this paper, we refer to a design procedure for LIL applied to fabricating photoresist templates for photonic crystal semiconductor slabs with periodic lattices of holes.
Keywords :
light interference; light interferometry; photonic crystals; photoresists; 2D periodic structures fabrication; laser interference lithography; optimum design parameters; periodic lattice holes; photonic crystal semiconductor slabs; photoresist templates; process design; two-dimensional periodic structures; Geometrical optics; Interference; Laser modes; Lattices; Lithography; Optical devices; Periodic structures; Process design; Resists; Slabs;
Conference_Titel :
Transparent Optical Networks, 2002. Proceedings of the 2002 4th International Conference on
Print_ISBN :
0-7803-7375-8
DOI :
10.1109/ICTON.2002.1007851
