DocumentCode
1687871
Title
Modeling and process design for laser interference lithography used in fabricating two-dimensional periodic structures
Author
Bostan, C.G. ; de Ridder, R.M. ; van Dorssen, I. ; van Wolferen, H. ; Kuipers, L. ; van Hulst, N.F.
Author_Institution
Lightwave Devices Group, Twente Univ., Enschede, Netherlands
Volume
2
fYear
2002
fDate
6/24/1905 12:00:00 AM
Abstract
Laser interference lithography (LIL) is a technique that can be successfully used for realization of 2D periodic structures, with excellent uniformity over large areas. However, detailed modeling is needed in order to extract the optimum design parameters. In this paper, we refer to a design procedure for LIL applied to fabricating photoresist templates for photonic crystal semiconductor slabs with periodic lattices of holes.
Keywords
light interference; light interferometry; photonic crystals; photoresists; 2D periodic structures fabrication; laser interference lithography; optimum design parameters; periodic lattice holes; photonic crystal semiconductor slabs; photoresist templates; process design; two-dimensional periodic structures; Geometrical optics; Interference; Laser modes; Lattices; Lithography; Optical devices; Periodic structures; Process design; Resists; Slabs;
fLanguage
English
Publisher
ieee
Conference_Titel
Transparent Optical Networks, 2002. Proceedings of the 2002 4th International Conference on
Print_ISBN
0-7803-7375-8
Type
conf
DOI
10.1109/ICTON.2002.1007851
Filename
1007851
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