DocumentCode :
1688778
Title :
Microwave Plasma Considerations Fur Cvd Of Diamond Films At Low Substrate Temperatures
Author :
Ulczynski, M. ; Reinhard, D.K. ; Prystajko, M. ; Asmussen, J.
Author_Institution :
Michigan State University
fYear :
1994
Firstpage :
164
Lastpage :
164
Keywords :
Atmospheric modeling; Atomic layer deposition; Atomic measurements; Diamond-like carbon; Inductors; Plasma chemistry; Plasma density; Plasma temperature; Plasma transport processes; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1994. Conference Record - Abstracts., 1994 IEEE International Conference on
Conference_Location :
Santa Fe, NM, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-2006-9
Type :
conf
DOI :
10.1109/PLASMA.1994.588979
Filename :
588979
Link To Document :
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