Buried Ceramic Layer Formation In Glass And Silicon Using Plasma Source Ion Implantation
Author :
Booske, John H. ; Zhan, Li ; Cooper, R.F. ; Shohet, J.L. ; Shenai, Krishna ; Dallman, D. ; Goeckner, M.J. ; Breun, R. ; Hitchon, William N. G. ; Wickesberg, E. ; Speth, R. ; Jacobs, J.R. ; Was, G.
Author_Institution :
University of Wisconsin
fYear :
1994
Firstpage :
166
Lastpage :
166
Keywords :
CMOS technology; Ceramics; DNA; Electron beams; Flue gases; Glass; Ion implantation; Plasma sources; Silicon; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1994. Conference Record - Abstracts., 1994 IEEE International Conference on
