DocumentCode :
1692449
Title :
The influence of the Hall scattering factor on the determination of activation energies of the nitrogen donors in 4H-SiC epitaxial layers
Author :
Rutsch, G. ; Devaty, R.P. ; Chovke, W.J.
Author_Institution :
Dept. of Phys. & Astron., Pittsburgh Univ., PA, USA
fYear :
1999
fDate :
6/21/1905 12:00:00 AM
Firstpage :
191
Lastpage :
194
Abstract :
In 4H-SiC, the most common donor impurity, nitrogen, is not always completely ionized at room temperature, so its activation energy can have a direct impact on device characteristics. Values of the activation energies of the nitrogen donors in SiC as determined by Hall effect measurements are frequently higher than values determined by optical measurements which should give a maximum value. The Hall scattering factor rH can skew activation energies if one uses the common approximation rH=1, so an investigation of this quantity was undertaken. rH can be measured if magnetic fields larger an 1/μD are available where μD is the electron drift mobility. The Hall scattering factor was measured on four 4H-SiC epitaxial layers at the National High Field Magnet Lab (NHMFL) in Tallahassee, Florida, USA with magnetic fields of up to 30 T. Nitrogen donor activation energies extracted from carrier concentration data corrected with Hall scattering factor information are within experimental error equal to these. The correction is not significant and cannot account for the experimental difference between electrical and optical data. Details of the procedure for extracting activation energies are presented
Keywords :
Hall mobility; high-temperature electronics; impurity states; nitrogen; semiconductor epitaxial layers; silicon compounds; wide band gap semiconductors; 0 to 30 T; 4H-SiC epitaxial layers; Hall scattering factor; N donors; SiC; activation energies; carrier concentration; device characteristics; donor impurity; electron drift mobility; Data mining; Electron mobility; Energy measurement; Hall effect; Impurities; Magnetic field measurement; Nitrogen; Optical scattering; Silicon carbide; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
High Temperature Electronics, 1999. HITEN 99. The Third European Conference on
Conference_Location :
Berlin
Print_ISBN :
0-7803-5795-7
Type :
conf
DOI :
10.1109/HITEN.1999.827494
Filename :
827494
Link To Document :
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